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Generation and Detection of Surface Plasmon Polaritons by Transition Metal Dichalcogenides for Chip-level Electronic-Photonic Integrated Circuits

机译:通过跃迁产生和检测表面等离子体极化子   用于芯片级电子光子集成电路的金属二硫化物

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摘要

The monolithic integration of electronics and photonics has attractedenormous attention due to its potential applications. However, the realizationof such hybrid circuits has remained a challenge because it requires opticalcommunication at nanometer scales. A major challenge to this integration is theidentification of a suitable material. After discussing the material aspect ofthe challenge, we identified atomically thin transition metal dichalcogenides(TMDs) as a perfect material platform to implement the circuit. The selectionof TMDs is based on their very distinct property: monolayer TMDs are able toemit and absorb light at the same wavelength determined by direct excitontransitions. To prove the concept, we fabricated simple devices consisting ofsilver nanowires as plasmonic waveguides and monolayer TMDs as activeoptoelectronic media. Using photoexcitation, direct optical imaging andspectral analysis, we demonstrated generation and detection of surface plasmonpolaritons by monolayer TMDs. Regarded as novel materials for electronics andphotonics, transition metal dichalcogenides are expected to find newapplications in next generation integrated circuits.
机译:电子和光子的单片集成由于其潜在的应用而引起了巨大的关注。但是,实现这种混合电路仍然是一个挑战,因为它需要纳米级的光通信。这种集成的主要挑战是确定合适的材料。在讨论了挑战的材料方面之后,我们确定了原子稀薄的过渡金属二卤化二金属锡(TMD)作为实现电路的理想材料平台。 TMD的选择基于其非常独特的特性:单层TMD能够发射和吸收由直接激子跃迁确定的相同波长的光。为了证明这一概念,我们制造了一些简单的设备,这些设备由银纳米线作为等离子波导管,单层TMD作为有源光电介质。使用光激发,直接光学成像和光谱分析,我们证明了单层TMD产生和检测表面等离激元极化子。作为用于电子和光子学的新型材料,过渡金属二卤化物有望在下一代集成电路中找到新的应用。

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